Study of Optimal Deposition Conditions for an Inductively Coupled Plasma Chemical Vapour Deposition (ICP-CVD) System
| dc.contributor.advisor | Mascher, P. | |
| dc.contributor.author | Zhang, Haiqiang | |
| dc.contributor.department | Engineering Physics | en_US |
| dc.date.accessioned | 2017-08-02T19:01:31Z | |
| dc.date.available | 2017-08-02T19:01:31Z | |
| dc.date.issued | 2005 | |
| dc.description.abstract | No abstract provided. | en_US |
| dc.description.degree | Master of Engineering (MEngr) | en_US |
| dc.description.degreetype | Thesis | en_US |
| dc.identifier.uri | http://hdl.handle.net/11375/21801 | |
| dc.language.iso | en | en_US |
| dc.subject | Optimal Deposition | en_US |
| dc.subject | Coupled Plasma | en_US |
| dc.subject | Vapour Deposition | en_US |
| dc.subject | (ICP-CVD) System | en_US |
| dc.title | Study of Optimal Deposition Conditions for an Inductively Coupled Plasma Chemical Vapour Deposition (ICP-CVD) System | en_US |