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Study of Optimal Deposition Conditions for an Inductively Coupled Plasma Chemical Vapour Deposition (ICP-CVD) System

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Primary Zhang_Haiqiang_2005_Masters.pdf (9.38 MB)

Date

Authors

Zhang, Haiqiang

Abstract

No abstract provided.

Keywords

Optimal Deposition, Coupled Plasma, Vapour Deposition, (ICP-CVD) System

URI

http://hdl.handle.net/11375/21801

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Digitized Open Access Dissertations and Theses