Some Ion-Bombardment Effects on Copper-Gold Alloys

dc.contributor.advisor	Thompson, D.A.
dc.contributor.advisor	Carter, G.
dc.contributor.author	Newcombe, Richard G.
dc.contributor.department	Engineering Physics	en_US
dc.date.accessioned	2016-07-21T14:42:47Z
dc.date.available	2016-07-21T14:42:47Z
dc.date.issued	1980-08
dc.description	Title: Some Ion-Bombardment Effects on Copper-Gold Alloys, Author: Richard G. Newcombe, Location: Thode	en_US
dc.description.abstract	<p>This report discusses some of the effects of medium-energy ion-bombardment on various copper-gold alloys. Thin (20nm-150nm) films of copper-gold alloys, on Si or SiO2 substrates, were bombarded with 30keV Ar+, 45keV Ar+, or 45 keV Bi+ ions, to fluences of up to 8 x 10^14 ions/mm2. One of the targets was held at ~50°K; the others were irradiated at room temperature. The effects were observed by 1.00 and 2.00 MeV He+ ion Rutherford backscattering. The results are discussed in terms of preferential sputtering, gas trapping, and surface topography.</p>	en_US
dc.description.degree	Master of Engineering (ME)	en_US
dc.description.degreetype	Thesis	en_US
dc.identifier.uri	http://hdl.handle.net/11375/19876
dc.language.iso	en	en_US
dc.title	Some Ion-Bombardment Effects on Copper-Gold Alloys	en_US
dc.type	Thesis	en_US

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Description:: Title: Some Ion-Bombardment Effects on Copper-Gold Alloys, Author: Richard G. Newcombe, Location: Thode

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