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Characterization of quantum wells using degree of polarization of photoluminescence

dc.contributor.advisorCassidy, D.T.en_US
dc.contributor.authorBalasubramanian, Lakshmien_US
dc.contributor.departmentEngineering Physicsen_US
dc.date.accessioned2014-06-18T16:41:49Z
dc.date.available2014-06-18T16:41:49Z
dc.date.created2010-09-28en_US
dc.date.issued1997-06en_US
dc.description.abstract<p>The state of polarization of photoluminescence that is emitted along (001) and (110) crystallographic orientations has been studied to obtain quantitative information on the interfacial strain, thickness and biaxial strain in InP/InGaAs(P)/InP quantum wells. It is demonstrated that the edge emission from quantum wells is a sensitive function of the strain and thickness of the quantum well. The anisotropic polarization of photoluminescence that is emitted normal to the plane of the quantum well provides information regarding the interfacial features. This anisotropy has been correlated to the anisotropic strain field that is associated with the strained bonds at the interfaces of the quantum wells.</p>en_US
dc.description.degreeDoctor of Philosophy (PhD)en_US
dc.identifier.otheropendissertations/3328en_US
dc.identifier.other4340en_US
dc.identifier.other1584523en_US
dc.identifier.urihttp://hdl.handle.net/11375/8094
dc.subjectEngineering Physicsen_US
dc.subjectOther Engineeringen_US
dc.subjectOther Engineeringen_US
dc.titleCharacterization of quantum wells using degree of polarization of photoluminescenceen_US
dc.typethesisen_US

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