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ELECTRICAL AND OPTICAL CHARACTERIZATION OF GaAs NANOWIRE ARRAYS

dc.contributor.advisorLaPierre, Ray
dc.contributor.authorZhang, Junpeng
dc.contributor.departmentEngineering Physicsen_US
dc.date.accessioned2014-11-10T20:27:46Z
dc.date.available2014-11-10T20:27:46Z
dc.date.issued2014
dc.description.abstractIII-V semiconductor nanowires (NWs) are often referred to as one-dimensional (1-D) materials because of their high aspect ratios and excellent quantum confinement properties. Spacing between NWs in a NW array is on the order of ~102 nm, which is close to the wavelength of visible light. These properties make NWs have excellent light trapping effects and suitability for optoelectronic applications, such as solar cells and photodetectors. Gallium arsenide (GaAs) has high electron mobility and a band gap of 1.424 eV, which makes it an ideal material for solar cells. Since GaAs NWs can be grown on either GaAs substrates or foreign substrates such as silicon (Si) substrates without lattice mismatch issues, they are being widely studied for photovoltaic applications. GaAs NWs could be achieved by the vapor-liquid-solid (VLS) method in molecular beam epitaxy (MBE), or etching a GaAs substrate by inductively coupled plasma reactive ion etching (ICP-RIE). Cyclotene was used as the filling material in gaps between NWs to support a low sheet resistance front contact and prevent shunts. An In/ITO contact was developed to achieve a lower contact resistance to n-GaAs NWs than an ITO contact, while it had a similar transmittance as ITO. A crack test also showed that insertion of a thin indium layer between ITO and GaAs NWs solved the ITO crack issue during heating that resulted from a large difference in coefficients of thermal expansion (CTE) between ITO and cyclotene. Energy dispersive x-ray spectrometry (EDS) was used to determine indium diffusion into NWs, and it showed that indium diffusion was not so significant to damage the features in NWs. A novel method to achieve substrate-free NW arrays by combining ICP-RIE and selective chemical etching together was also introduced. This method made it possible to measure the transmittance of NW arrays and contact layers for the first time. Absorption of GaAs NW arrays with various NW diameters and periods were also determined experimentally.en_US
dc.description.degreeMaster of Applied Science (MASc)en_US
dc.description.degreetypeThesisen_US
dc.identifier.urihttp://hdl.handle.net/11375/16364
dc.language.isoenen_US
dc.subjectGaAs nanowireen_US
dc.subjectITOen_US
dc.subjectAbsorptanceen_US
dc.subjectOhmic contacten_US
dc.titleELECTRICAL AND OPTICAL CHARACTERIZATION OF GaAs NANOWIRE ARRAYSen_US
dc.typeArticleen_US

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