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Laser Lithography of Diblock Copolymer Films

dc.contributor.advisorPreston, John S.
dc.contributor.advisorDalnoki-Veress, Kari
dc.contributor.authorParete, Joseph
dc.contributor.departmentEngineering Physicsen_US
dc.date.accessioned2015-01-23T18:03:58Z
dc.date.available2015-01-23T18:03:58Z
dc.date.issued2008-09
dc.description.abstractLaser lithography was used to create novel patterns in thin diblock copolymer films. These patterns were characterized and an examination of their formation and growth was conducted. The patterns occurred only in diblock films, due to the interaction between thermal gradient induced Marangoni flow and the self assembly of the molecules. Growth of the patterns was found to be strongly dependent on absorbed power. The impact of film thickness on pattern growth was mainly due to the corresponding changes in sample reflectance, however a periodic patterning was observed suggesting that growth is also dependent on the amount of 'excess' material (over that required to form complete lamella) available. It was also shown that the pattern growth can occur independently of laser lithography and the Marangoni effect, though laser lithography was required to direct this growth.en_US
dc.description.degreeMaster of Applied Science (MASc)en_US
dc.description.degreetypeThesisen_US
dc.identifier.urihttp://hdl.handle.net/11375/16667
dc.language.isoenen_US
dc.subjectlaser lithographyen_US
dc.subjectdiblock copolymeren_US
dc.subjectfilm thicknessen_US
dc.subjectpattern growthen_US
dc.titleLaser Lithography of Diblock Copolymer Filmsen_US
dc.typeThesisen_US

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