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Tunable Focused X-rays For Patterning and Lithography

dc.contributor.advisorHitchcock, Adam P.en_US
dc.contributor.advisorAndrew P. Knights, Harald D.H. Stöveren_US
dc.contributor.authorLeontowich, Adam F.G.en_US
dc.contributor.departmentChemistry and Chemical Biologyen_US
dc.date.accessioned2014-06-18T16:59:47Z
dc.date.available2014-06-18T16:59:47Z
dc.date.created2012-09-13en_US
dc.date.issued2012-10en_US
dc.description.abstract<p>Scanning transmission x-ray microscopes (STXM) focus monochromatic x-rays into an intense sub-30 nm diameter spot. Samples are then positioned at the focal plane and raster scanned through the spot while the transmitted x-rays are acquired to build up images at x-ray photon energies. In addition, x-ray absorption spectroscopy (XAS) can be performed by recording image sequences over a photon energy range of interest. STXMs excel at characterizing thin sections of inhomogeneous soft matter with their combination of high spatial (<30 nm) and photon energy (<0.1 eV) resolution. However, the overarching theme of this thesis is to apply the intense, tightly focused spot of x-rays to induce spatially resolved chemical and physical changes, and directly pattern materials, primarily thin polymer films. The irradiated areas are then investigated using several types of microscopy (scanning transmission x-ray, atomic force, scanning electron) and XAS. The experiments cover three broad areas: i) Nanofabrication; realization of the smallest possible feature sizes, and fabrication schemes unique to focused x-rays with applications including nanofluidics. ii) Radiation chemistry and physics; investigating the mechanisms of radiation-induced processes such as bond formation/loss, morphological change, carbon contamination, and temperature increase. iii) X-ray optics; the spatial distribution of x-rays at a focal plane can be recorded in a thin polymer film and later read out using an atomic force microscope. Applications include feedback for optics fabrication and enhanced image processing, the ultimate goal being increased spatial resolution.</p>en_US
dc.description.degreeDoctor of Philosophy (PhD)en_US
dc.identifier.otheropendissertations/7360en_US
dc.identifier.other8411en_US
dc.identifier.other3319976en_US
dc.identifier.urihttp://hdl.handle.net/11375/12476
dc.subjectlithographyen_US
dc.subjectradiation damageen_US
dc.subjectx-ray opticsen_US
dc.subjectsynchrotronen_US
dc.subjectNEXAFSen_US
dc.subjectmicroscopyen_US
dc.subjectPhysical Chemistryen_US
dc.subjectPhysical Chemistryen_US
dc.titleTunable Focused X-rays For Patterning and Lithographyen_US
dc.typedissertationen_US

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