A Study of Recombination Mechanisms in Gallium Arsenide using Temperature-Dependent Time-Resolved Photoluminescence
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Abstract
Recombination mechanisms in gallium arsenide have been studied using temperature-dependent time-resolved photoluminescence-decay. New analytical methods are presented to improve the accuracy in bulk lifetime measurement, and these have been used to resolve the temperature-dependent lifetime. Fits to temperature-dependent lifetime yield measurement of the radiative-efficiency, revealing that samples grown by the Czochralski and molecular-beam-epitaxy methods are limited by radiative-recombination at 77K, with defect-mediated nonradiative-recombination becoming competitive at 300K and above. In samples grown with both doping types using molecular-beam-epitaxy, a common exponential increase in capture cross-section characterized by a high value of E_infinity=(258 +/- 1)meV was observed from the high-level injection lifetime over a wide temperature range (300-700K). This common signature was also observed from 500-600K in the hole-lifetime observed in n-type Czochralski GaAs where E_infinity=(261 +/- 7)meV was measured, which indicates that this signature parametrizes the exponential increase in hole-capture cross-section. The high E_infinity value rules out all candidate defects except for EL2, by comparison with hole-capture cross-section data previously measured by others using deep-level transient spectroscopy.
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semiconductors, photovoltaics, solar energy, radiative efficiency, time resolved photoluminescence, photoluminescence decay, gallium arsenide, GaAs, III-V, direct bandgap, lifetime, diffusion, surface recombination, trapping, deep levels, EL2, dominant defect, defect characterization, photoluminescence spectroscopy, analytical methods, defect identification, double heterostructure