Sulfur Passivation of III-V Semiconductor Nanowires

Abstract

<p>An ammonium polysulfide (NH₄)₂S_x solution was optimized through a series of experiments to be used for surface passivation of III-V nanowires . The effectiveness of sulfur passivation was investigated by measuring the photoluminescence from p-InP nanowires before and after passivation. The optimized parameters included solvent type, molarity and passivation time. According to the experiments, passivation of nanowires in 0.5 M solution diluted in isopropyl alcohol for 5 min produced the maximum photoluminescence improvement. It was also demonstrated that the whole surface passivation of vertical nanowires in ensemble samples caused a 40 times increase in the photoluminescence intensity while top surface passivation of individual nanowires resulted in a 20 times increase of photoluminescence intensity. A model was developed to calculate the photoluminescence from single nanowires under different surface recombination and surface potential. The model showed that the 40 times increase in the photoluminescence is mainly due to the reduction of surface state density from 10¹² cm^-2before passivation to 5×10¹⁰ cm^-2after passivation.</p> <p>The effect of sulfur passivation on core-shell p-n junction GaAs nanowire solar cells has been investigated. The relative cell efficiency increased by 19% after passivation.</p>