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Please use this identifier to cite or link to this item: http://hdl.handle.net/11375/21420
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DC FieldValueLanguage
dc.contributor.advisorChisholm, S. H.-
dc.contributor.authorZimmermann, Detlef-
dc.date.accessioned2017-05-15T19:02:56Z-
dc.date.available2017-05-15T19:02:56Z-
dc.date.issued1970-05-
dc.identifier.urihttp://hdl.handle.net/11375/21420-
dc.description.abstract<p> The static electrical characteristics of dual-gate silicon n-channel insulated-gate field-effect trapsistors are investigated experimentally. A mathematical model based on theoretical expressions and containing twelve parameters adjusted for. best fit was developed. </p> <p> The mathematical model was used to calculate the low frequency conversion transconductance as a function of operating conditions. </p>en_US
dc.language.isoenen_US
dc.subjectmosfeten_US
dc.subjectmixing applicationen_US
dc.subjectelectricen_US
dc.subjectsiliconen_US
dc.titleDual-Gate Mosfet Static Characteristics Generated for Mixing Applicationsen_US
dc.contributor.departmentElectrical Engineeringen_US
dc.description.degreetypeThesisen_US
dc.description.degreeMaster of Engineering (MEngr)en_US
Appears in Collections:Digitized Open Access Dissertations and Theses

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