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Please use this identifier to cite or link to this item: http://hdl.handle.net/11375/17433
Full metadata record
DC FieldValueLanguage
dc.contributor.advisorChisholm, S. H.-
dc.contributor.authorCizmar , Edward S.-
dc.date.accessioned2015-06-01T20:40:41Z-
dc.date.available2015-06-01T20:40:41Z-
dc.date.issued1969-05-
dc.identifier.urihttp://hdl.handle.net/11375/17433-
dc.descriptionScope and contents: The static and dynamic electrical characteristics of silicon n-channel MOS FETs are studied down to cryogenic temperatures. Particular emphasis is directed towards the effect of interface states on the temperature dependence of both the pinch-off voltage and 1/f noise.en_US
dc.description.abstractNo abstract included.en_US
dc.language.isoenen_US
dc.subjectsilicon n-channel MOS FETsen_US
dc.subjectinterface statesen_US
dc.subjecttemperature dependenceen_US
dc.subjectpinch-off voltageen_US
dc.subject1/f noiseen_US
dc.titleA Low Temperature Study of the N-Channel MOS FETen_US
dc.typeThesisen_US
dc.contributor.departmentElectrical Engineeringen_US
dc.description.degreetypeThesisen_US
dc.description.degreeMaster of Engineering (MEngr)en_US
Appears in Collections:Open Access Dissertations and Theses

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