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http://hdl.handle.net/11375/15274
Title: | Electrodeposition of Tunable Zinc Oxide Nanomaterials for Optical Applications |
Authors: | Pavlovski, Joey |
Advisor: | Soleymani, Leyla |
Department: | Engineering Physics |
Keywords: | Electrodeposition of zinc oxide (ZnO);Motheye anti-reflection coatings;zinc oxide nanomaterials;anti-reflection coatings;solar optical applications;photovoltaics;Engineering Science and Materials;Materials Science and Engineering;Operations Research, Systems Engineering and Industrial Engineering;Engineering Science and Materials |
Publication Date: | Oct-2013 |
Abstract: | <p>Renewable energy technologies and the development of cleaner and more environmentally friendly power have been at the forefront of research for the past few decades. Photovoltaic systems – systems that convert photon energy to electrical energy – are at the center of these research efforts. Decreasing the cost of energy production, through increasing the power conversion efficiency or decreasing the device cost, is a key factor in widespread use of these energy production systems. To increase the energy conversion efficiency, ideally, all useful photons should be absorbed by the solar cell; however, due to the large discontinuity in the refractive index at the solar cell/air interface, a large fraction of incidence light is lost due to reflection (30% loss in crystalline silicon cells). The currently used single and double layer anti-reflection coatings reduce the reflection losses, but their optimal performance is limited to a narrow range of wavelengths and angles of incidence. Moth-eye anti-reflection coatings are composed of patterned single layer films having a gradual decrease in refractive index from the solar cell surface to air. This study is focused on developing an inexpensive method for direct deposition of patterned films – in the form of moth-eye anti-reflection coatings – on solar cell surface.</p> <p>In this research, the creation of moth-eye anti-reflection coatings has been attempted through the process of electrodeposition. ZnO was chosen for the thin film material, and the ability to develop the required moth-eye structure by changing the electrodeposition parameters including temperature, applied potential, type and concentration of solution-borne species, and type of substrate was investigated. Using this method, pyramidal and hemispherical structures with a 100-200 nm diameter and 100-200 nm height were created directly on ITO substrates. Similar structures were also developed on silicon substrates. The anti-reflection properties of ZnO-coated silicon substrates were investigated by comparing their broadband and broad angle reflection-mode UV-VIS spectrum with uncoated silicon. The optimized ZnO-coated silicon substrate showed a reflectance of at most 20% for wavelengths between 400-1500 nm at angles of incidence less than 50<sup>O</sup>.</p> |
URI: | http://hdl.handle.net/11375/15274 |
Identifier: | opendissertations/8228 9269 4586880 |
Appears in Collections: | Open Access Dissertations and Theses |
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fulltext.pdf | 3.02 MB | Adobe PDF | View/Open |
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