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Precursor and Reactivity Development for the Deposition of Main Group Element and Group 4 Metal Oxide Thin Films | 520 |
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Precursor and Reactivity Development for the Deposition of Main Group Element and Group 4 Metal Oxide Thin Films | 29 | 27 | 14 | 31 | 50 | 43 | 11 |
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Al Hareri_Majeda_June 2023_PhD.pdf | 121 |
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