Please use this identifier to cite or link to this item:
http://hdl.handle.net/11375/21801Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | Mascher, P. | - |
| dc.contributor.author | Zhang, Haiqiang | - |
| dc.date.accessioned | 2017-08-02T19:01:31Z | - |
| dc.date.available | 2017-08-02T19:01:31Z | - |
| dc.date.issued | 2005 | - |
| dc.identifier.uri | http://hdl.handle.net/11375/21801 | - |
| dc.description.abstract | No abstract provided. | en_US |
| dc.language.iso | en | en_US |
| dc.subject | Optimal Deposition | en_US |
| dc.subject | Coupled Plasma | en_US |
| dc.subject | Vapour Deposition | en_US |
| dc.subject | (ICP-CVD) System | en_US |
| dc.title | Study of Optimal Deposition Conditions for an Inductively Coupled Plasma Chemical Vapour Deposition (ICP-CVD) System | en_US |
| dc.contributor.department | Engineering Physics | en_US |
| dc.description.degreetype | Thesis | en_US |
| dc.description.degree | Master of Engineering (MEngr) | en_US |
| Appears in Collections: | Digitized Open Access Dissertations and Theses | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Zhang_Haiqiang_2005_Masters.pdf | 9.6 MB | Adobe PDF | View/Open |
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