Please use this identifier to cite or link to this item:
http://hdl.handle.net/11375/21801| Title: | Study of Optimal Deposition Conditions for an Inductively Coupled Plasma Chemical Vapour Deposition (ICP-CVD) System |
| Authors: | Zhang, Haiqiang |
| Advisor: | Mascher, P. |
| Department: | Engineering Physics |
| Keywords: | Optimal Deposition;Coupled Plasma;Vapour Deposition;(ICP-CVD) System |
| Publication Date: | 2005 |
| Abstract: | No abstract provided. |
| URI: | http://hdl.handle.net/11375/21801 |
| Appears in Collections: | Digitized Open Access Dissertations and Theses |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Zhang_Haiqiang_2005_Masters.pdf | 9.6 MB | Adobe PDF | View/Open |
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