Please use this identifier to cite or link to this item:
http://hdl.handle.net/11375/21801
Title: | Study of Optimal Deposition Conditions for an Inductively Coupled Plasma Chemical Vapour Deposition (ICP-CVD) System |
Authors: | Zhang, Haiqiang |
Advisor: | Mascher, P. |
Department: | Engineering Physics |
Keywords: | Optimal Deposition;Coupled Plasma;Vapour Deposition;(ICP-CVD) System |
Publication Date: | 2005 |
Abstract: | No abstract provided. |
URI: | http://hdl.handle.net/11375/21801 |
Appears in Collections: | Digitized Open Access Dissertations and Theses |
Files in This Item:
File | Description | Size | Format | |
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Zhang_Haiqiang_2005_Masters.pdf | 9.6 MB | Adobe PDF | View/Open |
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