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Please use this identifier to cite or link to this item: http://hdl.handle.net/11375/19714
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dc.contributor.advisorShewchun, J.-
dc.contributor.authorGupta, Krishna Kumar-
dc.date.accessioned2016-06-30T16:56:36Z-
dc.date.available2016-06-30T16:56:36Z-
dc.date.issued1972-10-
dc.identifier.urihttp://hdl.handle.net/11375/19714-
dc.description.abstract<p> The present work is aimed at studying the oxidation of thin films of nickel, nichrome and nickel phosphorous in air and water vapour at temperatures ranging from 100°C to 500°C. The optical constants, i.e., refractive index n and extinction coefficient k for these materials have been determined and their variation with temperature has been studied using ellipsometric technique. It has been shown that nickel oxide (NiO) is the more predominant phase in the oxides formed on these materials. It has also been found that within experimental error, the water vapour does not play a vital role in the oxidation process.</p>en_US
dc.language.isoen_USen_US
dc.subjectoxidation, characteristics, nickel, alloy, films, temperatureen_US
dc.titleOxidation Characteristics of Some Nickel Alloy Filmsen_US
dc.typeThesisen_US
dc.contributor.departmentPhysicsen_US
dc.description.degreetypeThesisen_US
dc.description.degreeMaster of Science (MSc)en_US
Appears in Collections:Open Access Dissertations and Theses

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