Skip navigation
  • Home
  • Browse
    • Communities
      & Collections
    • Browse Items by:
    • Publication Date
    • Author
    • Title
    • Subject
    • Department
  • Sign on to:
    • My MacSphere
    • Receive email
      updates
    • Edit Profile


McMaster University Home Page
  1. MacSphere
  2. Open Access Dissertations and Theses Community
  3. Open Access Dissertations and Theses
Please use this identifier to cite or link to this item: http://hdl.handle.net/11375/13246
Title: Anodic oxidation and depth-distribution studies with V, Mo, and W
Authors: Arora, Raj Mulk
Advisor: Kelly, R.
Department: Metallurgy and Materials Science
Keywords: Metallurgy and Materials Science;Materials Science and Engineering;Metallurgy;Materials Science and Engineering
Publication Date: Mar-1971
Abstract: <p>This investigation is primarily concerned with the development of a suitable high-precision sectioning technique to be employed in studies of depth distributions of energetic ions in Mo and V. It consists of two main parts.</p> <p>In the first part, uniform anodic oxide films of controlled thicknesses have been grown on poiycrystalline V, Mo, and W (the latter, primarily for comparison with earlier works on W) in acetic acid-sodium tetraborate solutions containing small quantities of water. These anodic films which show bright characteristic interference colours when formed at >10 volts, are shown to be rapidly soluble in a dilute solution of KOH whereas the underlying metal is attacked at a rate of less than ~100Å per day. The thickness of the anodic films per volt has been established using ellipsometry and conventional weight-loss measurements.</p> <p>Kinetics of anodization have been studied at constant-current and constant-voltage. An analysis of these data shows the composition of the films on Mo and W to be close to Mo0<sub>3</sub> and W0<sub>3</sub> respectively while those on V were intermediate between V<sub>2</sub>0<sub>4</sub> and V<sub>2</sub>0<sub>5</sub>. The density of the films on Mo and the differential field strength, E<sub>d</sub>, for films on Mo and W have also been determined.</p> <p>In the second part, a theoretical background consisting of an outline of the theory of Lindhard, Scharff and Schiøtt, has been provided; in the absence of experimental data, this theory is generally used to estimate the depth distribution of ions in amorphous targets. Experimental range profiles have been determined for 5-30 keV Kr<sup>85</sup> in polycrystalline Mo using the technique developed in the first part and the results obtained show a large discrepancy when compared with Lindhard theory. The extent of disagreement with theory is similar to that obtained by previous workers with targets such as Al or W.</p> <p>Evidence is presented to show that this large discrepancy may be attributted to crystal-lattice effects (i.e. channelling). For example, it is shown that the discrpency is not due to the anodizing-stripping sequence being sensitive to bombardment. Also, it is demonstrated that the Mo used had a pronounced preferred orientation such that the open directiors <100>, <211>, and <111> were normal to the surface.</p> <p>An important part of future work will be to extend techniques such as those described here to the metal Be, for Be is the lightest target material that can be conveniently worked with.</p>
URI: http://hdl.handle.net/11375/13246
Identifier: opendissertations/8066
9174
4529540
Appears in Collections:Open Access Dissertations and Theses

Files in This Item:
File SizeFormat 
fulltext.pdf
Open Access
2.4 MBAdobe PDFView/Open
Show full item record Statistics


Items in MacSphere are protected by copyright, with all rights reserved, unless otherwise indicated.

Sherman Centre for Digital Scholarship     McMaster University Libraries
©2022 McMaster University, 1280 Main Street West, Hamilton, Ontario L8S 4L8 | 905-525-9140 | Contact Us | Terms of Use & Privacy Policy | Feedback

Report Accessibility Issue